Project
Electron-beam lithography
Carbon nanotubes as electron sources for nanoscale patterning.
The research question
Can carbon nanotubes be used to focus and modulate electron beams for lithography, reducing the cost of the equipment traditionally required for nanoscale patterning?
The approach
The lab uses carbon-nanotube field emitters as electron sources and studies how their emission can be used to write patterns, with the goal of cutting equipment costs and easing bottlenecks in chip production. Related work on high-aspect-ratio patterning of carbon-nanotube forests appears in the lab’s publications.
How a pattern is written
A conceptual trace of pattern writing: a fine tip follows successive paths, leaving patterned lines behind. This is an illustrative test pattern, simplified for explanation — not a fabricated device layout or a measured result.
Related
- Field-emission & e-beam simulator — the lab’s browser-based simulation tools.
- Publications & patents — including CNT-forest micromachining papers.